Our PLASMAN-11 system features automatic or manual control (optional) and 10-3 Pa vacuum integrated pumping, pressure measurement at all ranges , and gas delivery packages optimized for customer specific process. - Full system for processes of chemical vapor deposition using plasma (PECVD). - Assessment for standard deposition process (SiO2,... Read more .

GRAPHMAN system feature high vacuum pumping, pressure measurement at all ranges, and gas delivery packages optimized for your specific process using graphene transparent electrodes and graphene microelectrode patterns. This is an affordable, semi-automatic and easy to use tool for thermal and plasma CVD based processes for a complete graphene processing. Read more .

CTNMAN system feature high vacuum pumping, pressure measurement at all ranges, and gas delivery packages optimized for your specific process using electrochemical electrodes and multielectrode arrays (MEAs) based on carbon nanotubes. This is an affordable, semiautomatic and easy to use tool for thermal and plasma CVD based processes for a complet CNTs processing. Read more .

Our PLASMAION system features automatic control and high vacuum integrated pumping, pressure measurement at all ranges, and gas delivery packages optimized for your specific process. Read more .